Trimethylgallium (TMGa), a metalorganic compound with the chemical formula Ga(CH₃)₃, is widely used as a precursor in the metalorganic chemical vapor deposition (MOCVD) process, primarily for the production of compound semiconductors such as gallium arsenide (GaAs), gallium nitride (GaN), and related materials. These semiconductors are critical for high-performance electronic and optoelectronic...